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Density and deposition rate of chemical-vapour-deposited boron nitride

✍ Scribed by Toshitsugu Matsuda; Hiroyuki Nakae; Toshio Irai


Publisher
Springer
Year
1988
Tongue
English
Weight
652 KB
Volume
23
Category
Article
ISSN
0022-2461

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Chemical and plasmachemical vapour depos
✍ Prof. Dr. H. Arnold; Dipl.-Chem. L. Biste; Dipl.- Ing. D. Bolze; Dr. G. Eichhorn πŸ“‚ Article πŸ“… 1976 πŸ› John Wiley and Sons 🌐 English βš– 281 KB

## Abstract AIN was deposited pyrolytically by means of the aluminium trichloride‐ammonia process (either introducing both compounds seperately or in complex form) and by plasmachemical reaction of aluminium trichloride with nitrogen at temperatures from 600 to 1300Β°C. Layers deposited onto (100) s