✦ LIBER ✦
Surface processes and rate-determining steps in plasma-induced chemical vapour deposition: Titanium nitride, boron carbide and silicon
✍ Scribed by S. Vepřek
- Publisher
- Elsevier Science
- Year
- 1990
- Tongue
- English
- Weight
- 869 KB
- Volume
- 43-44
- Category
- Article
- ISSN
- 0257-8972
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