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Deep levels in high resistivity GaN epilayers grown by MOCVD

โœ Scribed by Cebao Fang; Xiaoliang Wang; Junxi Wang; Chao Liu; Cuimei Wang; Guoxin Hu; Jianping Li; Chengji Li


Publisher
John Wiley and Sons
Year
2006
Tongue
English
Weight
270 KB
Volume
3
Category
Article
ISSN
1862-6351

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In this study, we present the results of investigation on p-n GaN diodes by means of deep level transient spectroscopy (DLTS) within the temperature range of 77-350 K. Si-doped GaN layers were grown by metal-organic vapor-phase epitaxy technique (MOVPE) on the free-standing GaN substrates. Subsequen