๐”– Bobbio Scriptorium
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Deep diffusion of boron into silicon single crystals

โœ Scribed by M.Y. Ben-Sira; S. Bukshpan


Publisher
Elsevier Science
Year
1965
Tongue
English
Weight
229 KB
Volume
3
Category
Article
ISSN
0038-1098

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๐Ÿ“œ SIMILAR VOLUMES


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Penetration curves were obtained for the diffusion of Nbe" into tantelum single crystals at temperatures 1050-1flOO"C. For the conditions of these experiments, the o&es were charaoterized by a region of large slope near the surface, followed by a region of muoh lesser slope deeper into the metal. Or

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