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Damage production and annealing of ion implanted silicon carbide

✍ Scribed by A. Heft; E. Wendler; J. Heindl; T. Bachmann; E. Glaser; H.P. Strunk; W. Wesch

Book ID: 113287325
Publisher: Elsevier Science
Year: 1996
Tongue: English
Weight: 565 KB
Volume: 113
Category: Article
ISSN: 0168-583X
DOI: 10.1016/0168-583x(95)01304-0

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