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Damage and its rapid thermal annealing kinetics in Ar+ ion implanted Cz silicon

✍ Scribed by S. Hahn; T. Hara; T. Maekawa; N. Satoh; Y.-K. Kwon; K.-I. Kim; Y.-H. Bae; W.-J. Chung; E.K. McIntyre; W.L. Smith; L. Larson; R. Meinecke

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