Silicon damage studies due to ultra-low-energy ion implantation with heavy species and rapid thermal annealing

✍ Scribed by S Moffatt; P.L.F Hemment; S Whelan; D.G Armour

• Publisher: Elsevier Science
• Year: 2000
• Tongue: English
• Weight: 396 KB
• Volume: 3
• Category: Article
• ISSN: 1369-8001
• DOI: 10.1016/s1369-8001(00)00046-9