Gas-phase Thermochemistry And Mechanism Of Organometallic Tin Oxide Cvd Precursors / M.d. Allendorf [and Others] -- Materials Chemistry Of Group 13 Nitrides / A. Devi [and Others] -- Single-source-precursor Cvd: Alkoxy And Siloxy Aluminum Hydrides / M. Veith -- Cvd Deposition Of Binary Alsb And Gasb
✦ LIBER ✦
CVD Deposition of Binary AlSb and GaSb Material Films — A Single-Source Approach
✍ Scribed by Stephan Schulz
- Book ID
- 101994927
- Publisher
- John Wiley and Sons
- Year
- 2006
- Weight
- 8 KB
- Volume
- 37
- Category
- Article
- ISSN
- 0931-7597
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✦ Synopsis
Abstract
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## Abstract Thin films of silver are deposited from tetraphenyldioxoimidodiphosphinato silver(I) [Ag{(OPPh~2~)~2~N}]~4~ · 2H~2~O (1) and silver(I) triflouoroacetate CF~3~COOAg (2) single‐source precursors (SSPs) by the aerosol‐assisted (AA)CVD method. The complex (1) is a tetramer with linear and d
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