[Topics in Organometallic Chemistry] Precursor Chemistry of Advanced Materials Volume 9 || CVD Deposition of Binary AlSb and GaSb Material Films -- a Single-Source Approach

✍ Scribed by Fischer, Roland A.

• Book ID: 124057327
• Publisher: Springer-Verlag
• Year: 2005
• Tongue: German
• Weight: 757 KB
• Edition: 2005
• Category: Article
• ISBN-13: 9783540016052
• DOI: 10.1007/b136144

✦ Synopsis

Gas-phase Thermochemistry And Mechanism Of Organometallic Tin Oxide Cvd Precursors / M.d. Allendorf [and Others] -- Materials Chemistry Of Group 13 Nitrides / A. Devi [and Others] -- Single-source-precursor Cvd: Alkoxy And Siloxy Aluminum Hydrides / M. Veith -- Cvd Deposition Of Binary Alsb And Gasb Material Films -- A Single-source Approach / S. Schulz -- Organometallic Precursors For Atomic Layer Deposition / M. Putkonen [and Others] -- Surface Reactivity Of Transition Metal Cvd Precursors: Towards The Control Of The Nucleation Step / P. Serp [and Others] -- Organometallic And Metallo-organic Precursors For Nanoparticles / M.a. Malik [and Others]. Volume Editor: Roland A. Fischer ; With Contributions By M.d. Allendorf ... [et Al.]. Includes Bibliographical References And Index.