Gas-phase Thermochemistry And Mechanism Of Organometallic Tin Oxide Cvd Precursors / M.d. Allendorf [and Others] -- Materials Chemistry Of Group 13 Nitrides / A. Devi [and Others] -- Single-source-precursor Cvd: Alkoxy And Siloxy Aluminum Hydrides / M. Veith -- Cvd Deposition Of Binary Alsb And Gasb
[Topics in Organometallic Chemistry] Precursor Chemistry of Advanced Materials Volume 9 || Organometallic and Metallo-Organic Precursors for Nanoparticles
β Scribed by Fischer, Roland A.
- Book ID
- 115480908
- Publisher
- Springer-Verlag
- Year
- 2005
- Tongue
- German
- Weight
- 844 KB
- Edition
- 2005
- Category
- Article
- ISBN-13
- 9783540016052
- DOI
- 10.1007/b136147
No coin nor oath required. For personal study only.
β¦ Synopsis
Gas-phase Thermochemistry And Mechanism Of Organometallic Tin Oxide Cvd Precursors / M.d. Allendorf [and Others] -- Materials Chemistry Of Group 13 Nitrides / A. Devi [and Others] -- Single-source-precursor Cvd: Alkoxy And Siloxy Aluminum Hydrides / M. Veith -- Cvd Deposition Of Binary Alsb And Gasb Material Films -- A Single-source Approach / S. Schulz -- Organometallic Precursors For Atomic Layer Deposition / M. Putkonen [and Others] -- Surface Reactivity Of Transition Metal Cvd Precursors: Towards The Control Of The Nucleation Step / P. Serp [and Others] -- Organometallic And Metallo-organic Precursors For Nanoparticles / M.a. Malik [and Others]. Volume Editor: Roland A. Fischer ; With Contributions By M.d. Allendorf ... [et Al.]. Includes Bibliographical References And Index.
π SIMILAR VOLUMES
Gas-phase Thermochemistry And Mechanism Of Organometallic Tin Oxide Cvd Precursors / M.d. Allendorf [and Others] -- Materials Chemistry Of Group 13 Nitrides / A. Devi [and Others] -- Single-source-precursor Cvd: Alkoxy And Siloxy Aluminum Hydrides / M. Veith -- Cvd Deposition Of Binary Alsb And Gasb
Gas-phase Thermochemistry And Mechanism Of Organometallic Tin Oxide Cvd Precursors / M.d. Allendorf [and Others] -- Materials Chemistry Of Group 13 Nitrides / A. Devi [and Others] -- Single-source-precursor Cvd: Alkoxy And Siloxy Aluminum Hydrides / M. Veith -- Cvd Deposition Of Binary Alsb And Gasb
Gas-phase Thermochemistry And Mechanism Of Organometallic Tin Oxide Cvd Precursors / M.d. Allendorf [and Others] -- Materials Chemistry Of Group 13 Nitrides / A. Devi [and Others] -- Single-source-precursor Cvd: Alkoxy And Siloxy Aluminum Hydrides / M. Veith -- Cvd Deposition Of Binary Alsb And Gasb
heterogeneous Catalysis Has Been Essential To The Development Of Efficient Chemical Processes For More Than A Century, And This Field Has Been Traditionally Part Of The Solid State Chemistry And Surface Science Communities. The Design Of Better Catalysts Has Raised The Following Questions: What Is T
heterogeneous Catalysis Has Been Essential To The Development Of Efficient Chemical Processes For More Than A Century, And This Field Has Been Traditionally Part Of The Solid State Chemistry And Surface Science Communities. The Design Of Better Catalysts Has Raised The Following Questions: What Is T