✦ LIBER ✦

Cu deposition using a permanent magnet electron cyclotron resonance microwave plasma source

✍ Scribed by Lee A. Berry; S.M. Gorbatkin; R.L. Rhoades

Book ID: 107864505
Publisher: Elsevier Science
Year: 1994
Tongue: English
Weight: 377 KB
Volume: 253
Category: Article
ISSN: 0040-6090
DOI: 10.1016/0040-6090(94)90352-2

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Electron Cyclotron Resonance Used in Low

Electron Cyclotron Resonance Used in Low-Pressure Microwave Plasma Reactors with Permanent Magnets

✍ A. B. Petrin 📂 Article 📅 2005 🏛 Springer 🌐 English ⚖ 190 KB

Electron cyclotron resonance microwave p

Electron cyclotron resonance microwave plasma deposition of a-Si:H and a-SiC:H films

✍ Y.H. Shing; F.S. Pool 📂 Article 📅 1991 🏛 Elsevier Science ⚖ 547 KB

Electron cyclotron resonance plasma depo

Electron cyclotron resonance plasma deposition of cubic boron nitride using N-trimethylborazine

✍ A. Weber; U. Bringmann; R. Nikulski; C.-P. Klages 📂 Article 📅 1993 🏛 Elsevier Science 🌐 English ⚖ 468 KB

Deposition of dielectrics using a matrix

Deposition of dielectrics using a matrix distributed electron cyclotron resonance plasma enhanced chemical vapor deposition system

✍ R. Botha; B. Haj Ibrahim; P. Bulkin; B. Drévillon 📂 Article 📅 2007 🏛 Elsevier Science 🌐 English ⚖ 470 KB

Effects of microwave power and bias volt

Effects of microwave power and bias voltage on deposition of amorphous hydrogenated carbon films using electron cyclotron resonance plasma chemical vapour deposition

✍ K. Maruyama; T. Inoue; M. Yamamoto; T. Morinaga; H. Saitoh; K. Kamata 📂 Article 📅 1994 🏛 Springer 🌐 English ⚖ 327 KB

Amorphous carbon film deposition using a

Amorphous carbon film deposition using a DC-biased screen-grid in an electron cyclotron resonance plasma

✍ SF Yoon; Ruslie; J Ahn; Q Zhang; YS Wu; H Yang 📂 Article 📅 1998 🏛 Elsevier Science 🌐 English ⚖ 330 KB

The deposition of hydrogenated amorphous carbon (a-C:H) films from a mixture of hydrogen and methane using the electron cyclotron resonance chemical vapour deposition (ECR-CVD) method is reported. A screen grid positioned above the substrate was used to provide an electric field to accelerate the io