Cr-doped TiO2 thin films deposited by RF-sputtering
β Scribed by Tae Ho Jun; Kee Sun Lee
- Book ID
- 113793831
- Publisher
- Elsevier Science
- Year
- 2010
- Tongue
- English
- Weight
- 900 KB
- Volume
- 64
- Category
- Article
- ISSN
- 0167-577X
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Ag nanostructures on TiO 2 films were deposited by RF magnetron sputtering under variable deposition parameters, such as DC potential, RF-power and total pressure. The concentration, shape, and distribution of the deposited nanostructures and continuous Ag films on thin films of TiO 2 can be tailore
In this investigation, nanoindentation, nanoscratch and nanowear tests were done in order to study the nanomechanical and nanotribological properties of the chromium carbide nanostructured thin films. Chromium carbide films were synthesized by rf sputtering from a Cr 3 C 2 target on magnesium oxide