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Correlation between Photoluminescence Intensity and Micro Structure in Amorphous Silicon Films Prepared by Reactive RF Sputtering

✍ Scribed by Umezu, Ikurou; Murota, Takatoshi; Kawata, Masayuki; Takashima, Yoshiaki; Yoshida, Ken-ichi; Inada, Mitsuru; Sugimura, Akira


Book ID
124086577
Publisher
Institute of Pure and Applied Physics
Year
2000
Tongue
English
Weight
51 KB
Volume
39
Category
Article
ISSN
0021-4922

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