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Concentration and thermal release of hydrogen in amorphous silicon carbide films prepared by rf sputtering

โœ Scribed by Y Suzaki; T Shikama; S Yoshioka; K Yoshii; K Yasutake


Book ID
108389205
Publisher
Elsevier Science
Year
1997
Tongue
English
Weight
228 KB
Volume
311
Category
Article
ISSN
0040-6090

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