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Controlling the diffusion of implanted boron in Si and silicide by multiple implants

✍ Scribed by Chih-Hsun Chu; Kwhy-Jrung Ho; Cheng-Tung Huang; Shin-Huey Shvu; Tan-Fu Lei

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Very shallow boron junctions in Si by im

✍ J. Plaza Castillo; A. Torres Jácome; O. Malik; N. Torres López 📂 Article 📅 2008 🏛 Elsevier Science 🌐 English ⚖ 310 KB

Transient diffusion of boron implanted i

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A simple model for boron trapping by He

✍ F. Cayrel; D. Alquier; D. Mathiot; L. Ventura; L. Vincent; G. Gaudin; R. Jérisia 📂 Article 📅 2004 🏛 Elsevier Science 🌐 English ⚖ 404 KB

Characterization of buried cobalt silici

✍ Qicai Peng; S.P. Wong; I.H. Wilson; N. Wang; K.K. Fung 📂 Article 📅 1995 🏛 Elsevier Science 🌐 English ⚖ 698 KB

Boron diffusion in presence of defects i

✍ F. Cayrel; D. Alquier; C. Dubois; R. Jérisian 📂 Article 📅 2005 🏛 Elsevier Science 🌐 English ⚖ 258 KB

Control of implant-damage-enhanced boron

✍ T. Ghani; J. L. Hoyt; A. M. McCarthy; J. F. Gibbons 📂 Article 📅 1995 🏛 Springer US 🌐 English ⚖ 436 KB