Very shallow boron junctions in Si by implantation and SOD diffusion obtained by RTP

✍ Scribed by J. Plaza Castillo; A. Torres Jácome; O. Malik; N. Torres López

• Publisher: Elsevier Science
• Year: 2008
• Tongue: English
• Weight: 310 KB
• Volume: 39
• Category: Article
• ISSN: 0026-2692
• DOI: 10.1016/j.mejo.2007.07.058