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A simple model for boron trapping by He implantation extended defects in Si: the role of boron diffusivity

✍ Scribed by F. Cayrel; D. Alquier; D. Mathiot; L. Ventura; L. Vincent; G. Gaudin; R. Jérisian


Book ID
113822696
Publisher
Elsevier Science
Year
2004
Tongue
English
Weight
404 KB
Volume
216
Category
Article
ISSN
0168-583X

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