𝔖 Bobbio Scriptorium
✦   LIBER   ✦

Control of Interface Traps in HfO2Gate Dielectric on Silicon

✍ Scribed by S. Y. Tan


Book ID
107457004
Publisher
Springer US
Year
2010
Tongue
English
Weight
558 KB
Volume
39
Category
Article
ISSN
0361-5235

No coin nor oath required. For personal study only.


πŸ“œ SIMILAR VOLUMES


Interface control of high-k gate dielect
✍ M. Caymax; M. Houssa; G. Pourtois; F. Bellenger; K. Martens; A. Delabie; S. Van πŸ“‚ Article πŸ“… 2008 πŸ› Elsevier Science 🌐 English βš– 686 KB
Ultrathin HfO2 films grown on silicon by
✍ E.P. Gusev; C. Cabral Jr.; M. Copel; C. D’Emic; M. Gribelyuk πŸ“‚ Article πŸ“… 2003 πŸ› Elsevier Science 🌐 English βš– 584 KB

We report on growth behavior, structure, thermal stability and electrical properties of ultrathin (,10 nm) hafnium oxide films deposited by atomic layer deposition using sequential exposures of HfCl and H O at 300 8C on a bare silicon surface 4 2 or a thin thermally grown SiO -based interlayer. Comp