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Conductive SU8 Photoresist for Microfabrication

✍ Scribed by S. Jiguet; A. Bertsch; H. Hofmann; P. Renaud

Book ID
101414882
Publisher
John Wiley and Sons
Year
2005
Tongue
English
Weight
324 KB
Volume
15
Category
Article
ISSN
1616-301X

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✍ SΓ©bastien Jiguet; Arnaud Bertsch; Moshe Judelewicz; Heinrich Hofmann; Philippe R πŸ“‚ Article πŸ“… 2006 πŸ› Elsevier Science 🌐 English βš– 231 KB

A new nanocomposite photoresist based on SU-8 epoxy resin has been developed. It consists in a homogeneous dispersion of nanosilica particles in the negative tone photosensitive SU-8. The nanocomposite photoresist is more sensitive than the SU-8 photoresist and the photopatterned composite structure