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Compositional and morphological study of reactive ion beam deposited AlN thin films

✍ Scribed by L.L Cheng; Y.H Yu; B Sundaravel; E.Z Luo; S Lin; Y.M Lei; C.X Ren; W.Y Cheung; S.P Wong; J.B Xu; I.H Wilson

No coin nor oath required. For personal study only.

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