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Compositional analysis of thin SiOxNy:H films by heavy-ion ERDA, standard RBS, EDX and AES: a comparison

✍ Scribed by W Bohne; J Röhrich; A Schöpke; B Selle; I Sieber; W Fuhs; Á del Prado; E San Andrés; I Mártil; G González-Dı́az

Book ID: 113822650
Publisher: Elsevier Science
Year: 2004
Tongue: English
Weight: 393 KB
Volume: 217
Category: Article
ISSN: 0168-583X
DOI: 10.1016/j.nimb.2003.11.003

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