Composition, chemical bonding and mechanical properties of magnetron sputtered CNx thin films at different substrate bias

✍ Scribed by M. Gioti; S. Logothetidis; C. Charitidis; H. Lefakis

• Publisher: Elsevier Science
• Year: 1999
• Tongue: English
• Weight: 116 KB
• Volume: 53
• Category: Article
• ISSN: 0042-207X
• DOI: 10.1016/s0042-207x(98)00421-7

✦ Synopsis

Nitrogenated amorphous carbon films (a-CN

V ) were prepared by reactive magnetron sputtering at room temperature with different substrate bias voltage (» ) and N concentration in the plasma. In situ spectroscopic ellipsometry (SE) data analysis was used to monitor the composition and the film thickness as well as to study the optical properties. The negative » was found to affect the film composition by favoring the formation of sp bond. The chemical bonding in the films was identified by the new Fourier transform IR SE technique. The elastic properties of a-CN V films were also examined and the results suggest a predominately elastic behavior for films deposited with negative » . In addition, stress measurements conducted during thermal annealing up to 300°C, provide the stability of a-CN V films grown with negative » .