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Composition and structure of boron nitride films deposited by chemical vapor deposition from borazine

โœ Scribed by Kouvetakis, J.


Book ID
121819829
Publisher
AVS (American Vacuum Society)
Year
1990
Tongue
English
Weight
592 KB
Volume
8
Category
Article
ISSN
0734-2101

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## Abstract The kinetics of the CVD of boron nitride from trimethoxyborane (TMOB) and ammonia (NH~3~) under atmospheric pressure was investigated by varying the following process parameters: temperature, residence time of the reactants, molar fraction of TMOB, and the NH~3~/TMOB ratio, ฮณ. A kinetic