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Boron nitride thin films by microwave ECR plasma chemical vapor deposition

โœ Scribed by M.J. Paisley; L.P. Bourget; R.F. Davis

Book ID
107864212
Publisher
Elsevier Science
Year
1993
Tongue
English
Weight
469 KB
Volume
235
Category
Article
ISSN
0040-6090

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Silicon nitride films of various compositions have been deposited on silicon substrate by electron cyclotron resonance plasma-enhanced chemical vapor deposition (ECR-PECVD) technique from mixtures of Ar, N and SiH as precursors. Film 2 4 composition and refractive index as a function of deposition p