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Composition and hardness of chemically vapour-deposited silicon carbide with various microstructures

✍ Scribed by Y. -W. Kim; S. -W. Park; J. -G. Lee

Publisher
Springer
Year
1993
Tongue
English
Weight
667 KB
Volume
14
Category
Article
ISSN
0261-8028

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## Abstract The paper reports the results of a structural investigation of C.V.D. tantalum, which had been deposited on a silica substrate. Deposits at 1000Β°C were high impurity powders or flakes, at 1100Β°C (normal deposition temperature) foil‐like, these containing much lower silicon contents, bei