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Chemical vapour deposition of boron carbides I: Phase and chemical composition

✍ Scribed by U. Jansson; J.-O. Carlsson; B. Stridh; S. Söderberg; M. Olsson

Publisher
Elsevier Science
Year
1989
Tongue
English
Weight
715 KB
Volume
172
Category
Article
ISSN
0040-6090

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## Abstract The paper reports the results of a structural investigation of C.V.D. tantalum, which had been deposited on a silica substrate. Deposits at 1000°C were high impurity powders or flakes, at 1100°C (normal deposition temperature) foil‐like, these containing much lower silicon contents, bei