𝔖 Bobbio Scriptorium
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Composition and detection of alignment marks for electron-beam lithography


Book ID
104263774
Publisher
Elsevier Science
Year
1976
Tongue
English
Weight
148 KB
Volume
26
Category
Article
ISSN
0042-207X

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✍ T. Matsuzaka πŸ“‚ Article πŸ“… 1997 πŸ› Elsevier Science 🌐 English βš– 386 KB

Electron beam lithography is available in fabrication for ASIC-LSIs in order to contribute QTAT process and cost saving for optical reticle making. On the other hand, the optical lithography is facing difficulty in the resolution for isolated pattern arrangement under quarter micron region even if K