𝔖 Bobbio Scriptorium
✦   LIBER   ✦

Complete optical characterization of imperfect hydrogenated amorphous silicon layers by spectroscopic ellipsometry and spectroscopic reflectometry

✍ Scribed by D. Franta; I. Ohlídal; D. Munzar; J. Hora; K. Navrátil; C. Manfredotti; F. Fizzotti; C. Vittone


Book ID
114086650
Publisher
Elsevier Science
Year
1999
Tongue
English
Weight
383 KB
Volume
343-344
Category
Article
ISSN
0040-6090

No coin nor oath required. For personal study only.


📜 SIMILAR VOLUMES


Complete optical characterization of the
✍ Ohlídal, I.; Franta, D.; Pinčík, E.; Ohlídal, M. 📂 Article 📅 1999 🏛 John Wiley and Sons 🌐 English ⚖ 78 KB 👁 2 views

In this paper results concerning optical analysis of the SiO 2 =Si system performed by the combined ellipsometric and reflectometric method used in multiple-sample modification will be presented. This method is based on combining both the single-wavelength method and the dispersion method. Three mod

Optical Characterization of Silicon Oxyn
✍ Yi-Ming Xiong; Paul G. Snyder; John A. Woollam; G. A. Al-Jumaily; F. J. Gagliard 📂 Article 📅 1992 🏛 John Wiley and Sons 🌐 English ⚖ 424 KB

## Abstract Silicon oxynitride (SiO~x~ N~y~) thin films were deposited on silicon substrates by ion‐assisted deposition. Variable angle spectroscopic ellipsometry (VASE) was used to optically characterize the deposited film properties, such as layer thickness and composition, film surface and inter