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Comparison of ultra-thin gate dielectrics for 0.1 μm MOS devices

✍ Scribed by F. Bénistant; F. Mondon; F. Martin; G. Guégan


Publisher
Elsevier Science
Year
1995
Tongue
English
Weight
328 KB
Volume
28
Category
Article
ISSN
0167-9317

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We study the physical limitations of MOSFETs around 0.1 mm and introduce a new scaling scenario for sub-0.1-mm MOS devices. At low transverse electric fields, that is, for low carrier densities in SOI devices under low gate drive conditions, it is possible to achieve electron velocity overshoot due