✦ LIBER ✦
Ultra shallow P+/N junctions using plasma immersion ion implantation and laser annealing for sub 0.1 μm CMOS devices
✍ Scribed by Frank Torregrosa; Cyrille Laviron; Frédéric Milesi; Miguel Hernandez; Hasna Faïk; Julien Venturini
- Publisher
- Elsevier Science
- Year
- 2005
- Tongue
- English
- Weight
- 516 KB
- Volume
- 237
- Category
- Article
- ISSN
- 0168-583X
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