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Comparison of the annealing behavior of thin Ta films deposited onto Si and SiO2substrates

✍ Scribed by R. Hübner; M. Hecker; N. Mattern; V. Hoffmann; K. Wetzig; H.-J. Engelmann; E. Zschech


Book ID
105888866
Publisher
Springer
Year
2004
Tongue
English
Weight
490 KB
Volume
379
Category
Article
ISSN
1618-2650

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