𝔖 Bobbio Scriptorium
✦   LIBER   ✦

Comparison in mechanical and tribological properties of Cr–W–N and Cr–Mo–N multilayer films deposited by DC reactive magnetron sputtering

✍ Scribed by B. Gu; J.P. Tu; X.H. Zheng; Y.Z. Yang; S.M. Peng

Publisher
Elsevier Science
Year
2008
Tongue
English
Weight
954 KB
Volume
202
Category
Article
ISSN
0257-8972

No coin nor oath required. For personal study only.

✦ Synopsis

Cr-W-N and Cr-Mo-N films were deposited on high speed steel substrate by unbalanced DC reactive magnetron sputtering. Cross-sectional scanning electron microscopy (SEM) morphologies of the films confirmed that the bilayer thickness of multilayer became thinner, and then structural transformation occurred from multilayer to composite with increasing the rotation velocity of substrate holder. X-ray diffraction (XRD) patterns indicated that the Cr-W-N films were composed of CrN and W 2 N crystalline phases, and the Cr-Mo-N films consisted of crystalline CrN and amorphous/nanocrystalline Mo 2 N. Mechanical and tribological properties were investigated by using a nanoindentor and a ball-on-disk tribometer, respectively. The Cr-W-N films exhibited excellent mechanical properties and wear resistance, while Cr-Mo-N films showed lower friction coefficient. Optimal mechanical and tribological properties were obtained in the Cr-W-N multilayer film with a bilayer period of 12 nm.

📜 SIMILAR VOLUMES

Microstructure, mechanical and electroch
Microstructure, mechanical and electrochemical properties evaluation of pulsed DC reactive magnetron sputtered nanostructured Cr–Zr–N and Cr–Zr–Si–N thin films
✍ Jyh-Wei Lee; Shih-Tien Chang; Hsien-Wei Chen; Chi-Hong Chien; Jenq-Gong Duh; Cha 📂 Article 📅 2010 🏛 Elsevier Science 🌐 English ⚖ 973 KB

Cr-Zr-Si-N thin films with various Zr contents were deposited by a bipolar asymmetric pulsed DC reactive magnetron sputtering system. In addition, a Cr-Zr-N film without Si addition was fabricated as a reference. The influence of Zr on the constitution, microstructure, mechanical, tribological and e

Tribological properties and oxidation re
Tribological properties and oxidation resistance of (Cr,Al,Y)N and (Cr,Al,Si)N films synthesized by radio-frequency magnetron sputtering method
✍ T. Miyake; A. Kishimoto; H. Hasegawa 📂 Article 📅 2010 🏛 Elsevier Science 🌐 English ⚖ 906 KB

Quaternary (Cr,Al)N-based nitride was synthesized from alloy targets by the radio-frequency magnetron sputtering method. The mole fractions of (Cr,Al,Y)N were 44 mol% CrN, 52 mol% AlN and 4 mol% YN, while those of (Cr,Al,Si)N was 49 mol% CrN, 47 mol% AlN, and 4 mol% SiN. As-deposited (Cr,Al,Y)N and

Microstructure and mechanical properties
Microstructure and mechanical properties of Cr–Si–N coatings prepared by pulsed reactive dual magnetron sputtering
✍ M. Benkahoul; P. Robin; S.C. Gujrathi; L. Martinu; J.E. Klemberg-Sapieha 📂 Article 📅 2008 🏛 Elsevier Science 🌐 English ⚖ 429 KB

Cr-Si-N thin films were deposited by pulsed DC reactive dual-magnetron sputtering using Cr and Si targets, while various currents applied to the Si target allowed one to vary the Si content (C Si ) in the films. Microstructure, composition and mechanical properties were studied as a function of C Si

Relationship between Condition of Deposi
Relationship between Condition of Deposition and Properties of W-Ti-N Thin Films Prepared by Reactive Magnetron Sputtering
✍ A. V. Kuchuk; V. P. Kladko; O. S. Lytvyn; A. Piotrowska; R. A. Minikayev; R. Rat 📂 Article 📅 2006 🏛 John Wiley and Sons 🌐 English ⚖ 313 KB 👁 2 views

A correlation between the film properties of nitrides, oxides etc., and their structure, is of fundamental importance – not only for thin solid films physics but also for practical applications. The structure of the films depends on deposition methods and their parameters. The relationship between p

Effect of Al content on the microstructu
Effect of Al content on the microstructure and mechanical properties of Mo–Al–Si–N films synthesized by DC magnetron sputtering
✍ Z.G. Yuan; J.F. Yang; X.P. Wang; Q.F. Fang 📂 Article 📅 2010 🏛 Elsevier Science 🌐 English ⚖ 642 KB

Mo-Al-Si-N films were deposited by reactive magnetron sputtering on substrates of Si wafer, alumina, and stainless steel from composite targets consisting of Mo, Al and Si. To investigate the effect of Al content on the properties of the Mo-Al-Si-N films at a constant Si content of 9 at.%, the chemi