Tribological properties and oxidation resistance of (Cr,Al,Y)N and (Cr,Al,Si)N films synthesized by radio-frequency magnetron sputtering method

✍ Scribed by T. Miyake; A. Kishimoto; H. Hasegawa

• Publisher: Elsevier Science
• Year: 2010
• Tongue: English
• Weight: 906 KB
• Volume: 205
• Category: Article
• ISSN: 0257-8972
• DOI: 10.1016/j.surfcoat.2010.08.017

✦ Synopsis

Quaternary (Cr,Al)N-based nitride was synthesized from alloy targets by the radio-frequency magnetron sputtering method. The mole fractions of (Cr,Al,Y)N were 44 mol% CrN, 52 mol% AlN and 4 mol% YN, while those of (Cr,Al,Si)N was 49 mol% CrN, 47 mol% AlN, and 4 mol% SiN. As-deposited (Cr,Al,Y)N and (Cr,Al,Si)N films had a cubic NaCl structure, and their average surface roughness Ra was approximately 8.1 nm and 6.3 nm, respectively. From thermogravimetric analyses, the weight of (Cr,Al,Y)N was observed to increase from 0.03 mg/cm 2 to 0.30 mg/cm 2 in the temperature range of 600 °C-1000 °C. In contrast, a linear increase in the mass gain of (Cr,Al,Si)N from 0.05 mg/cm 2 to 0.18 mg/cm 2 was observed up to a temperature of 1000 °C. Structural changes from single-phase cubic (NaCl) to wurtzite (AlN) and Cr 2 N occurred after thermal annealing in an ambient environment. During oxidation, metallic elements diffused toward the top surface, where the growth of oxides such as Cr 2 O 3 , Al 2 O 3 and Y 2 O 3 were confirmed. For the tribological test, the friction coefficient was below 0.6 under dry conditions at room temperature.