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Comparative investigation of damage induced by diatomic and monoatomic ion implantation in silicon

✍ Scribed by T. Lohner; Z. Tóth; M. Fried; N.Q. Khánh; Gen Qing Yang; Lin Chen Lu; Zou Shichang; L.J. Hanekamp; A. van Silfhout; J. Gyulai

No coin nor oath required. For personal study only.

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