𝔖 Bobbio Scriptorium
✦   LIBER   ✦

Chemistry and kinetics of chemical vapor deposition of pyrocarbon — III pyrocarbon deposition from propylene and benzene in the low temperature regime

✍ Scribed by A. Becker; K.J. Hüttinger


Publisher
Elsevier Science
Year
1998
Tongue
English
Weight
924 KB
Volume
36
Category
Article
ISSN
0008-6223

No coin nor oath required. For personal study only.

✦ Synopsis


Pyrocarbon deposition

from propylene and benzene was studied at ambient pressure and 1000°C using a vertical hot-wall reactor. Initial partial pressures of the hydrocarbons and residence time were varied; the influence of hydrogen in the feed gas was additionally studied. Gaseous and liquid reaction products were analyzed by on-line gas chromatography.

The results are discussed in terms of homogeneous gas-phase and heterogeneous pyrocarbon deposition reactions. Reactions models have been derived and used for simulation of pyrocarbon deposition rates and their inhibition by hydrogen.

Pyrocarbon deposition from propylene is shown to be controlled by complex pyrolysis reactions in the gas-phase, whereas benzene forms pyrocarbon directly, i.e. without significant formation of intermediate products in the gas-phase.


📜 SIMILAR VOLUMES


Chemistry and kinetics of chemical vapor
✍ A. Becker; K.J. Hüttinger 📂 Article 📅 1998 🏛 Elsevier Science 🌐 English ⚖ 820 KB

Pyrocarbon deposition from methane was studied at ambient pressure and a temperature of 1100°C using a vertical hot-wall reactor with a honeycomb structure as substrate. Compared to the deposition tube used in previous studies this substrate exhibits a 15fold increase in surface area. The methane in

On chemical kinetics of silicon depositi
✍ Dr. H. Kühne; H. Harnisch; P. Puk; B. Lassan 📂 Article 📅 1990 🏛 John Wiley and Sons 🌐 English ⚖ 519 KB

## On Chemical Kinetics of Silicon Deposition from Silane (111) LPCVD poly Silicon Formation in the Temperature Range 900-950 K LPCVD poly Silicon deposition form silane has been investigated for limited conditions regarding temperature, silane input and pumping speed. It has been found that layer