ChemInform Abstract: Present and Future Role of Chemical Mechanical Polishing in Wafer Bonding
β Scribed by C. GUI; M. ELWENSPOEK; J. G. E. GARDENIERS; P. V. LAMBECK
- Publisher
- John Wiley and Sons
- Year
- 2010
- Weight
- 25 KB
- Volume
- 29
- Category
- Article
- ISSN
- 0931-7597
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Electrochemistry of Chemical Vapor Deposited Tungsten Films with Relevance to Chemical Mechanical Polishing. -The passivation and etching behavior of CVD tungsten films under acidic conditions relevant to chemical mechanical polishing is studied by electrochemical and XPS methods. According to dc p
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