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Chemically amplified resists: Chemistry and processes

✍ Scribed by E. Reichmanis; F. M. Houlihan; O. Nalamasu; T. X. Neenan

Book ID
111997918
Publisher
John Wiley and Sons
Year
1994
Tongue
English
Weight
845 KB
Volume
4
Category
Article
ISSN
1616-301X

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✍ T. Itani; H. Yoshino; S. Hashimoto; M. Yamana; N. Samoto; K. Kasama πŸ“‚ Article πŸ“… 1997 πŸ› Elsevier Science 🌐 English βš– 274 KB

In order to clarify the photogenerated acid diffusion in resist film, the diffusion behavior of acid, as well as the role of additional base component was investigated in tert-butoxycarbonyl (t-BOC) protected type chemically amplified positive deep ultraviolet (DUV) resists. The resists consisted of