Atomistic modeling of chemical vapor dep
Atomistic modeling of chemical vapor deposition: silicon nitride CVD from dichlorosilane and ammonia
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A.A Bagatur’yants; K.P Novoselov; A.A Safonov; L.L Savchenko; J.V Cole; A.A Kork
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Article
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2000
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Elsevier Science
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English
⚖ 367 KB