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Chemical vapor deposition of SnO2 thin films on rutile single crystals

✍ Scribed by Masamitsu Nagano

Publisher
Elsevier Science
Year
1984
Tongue
English
Weight
918 KB
Volume
67
Category
Article
ISSN
0022-0248

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πŸ“œ SIMILAR VOLUMES

Chemical Vapor Deposition of Niobium Dis
Chemical Vapor Deposition of Niobium Disulfide Thin Films
✍ ClaireΒ J. Carmalt; EmilyΒ S. Peters; IvanΒ P. Parkin; TroyΒ D. Manning; AndrewΒ L. H πŸ“‚ Article πŸ“… 2004 πŸ› John Wiley and Sons 🌐 English βš– 175 KB πŸ‘ 2 views

## Abstract Atmospheric pressure chemical vapor deposition (APCVD) of niobium sulfide coatings was achieved on glass substrates from the reaction of NbCl~5~ and S(SiMe~3~)~2~, __t__Bu~2~S~2~, __t__BuSH, or HSCH~2~CH~2~SH at 250βˆ’600 Β°C. The niobium sulfide films grown at temperatures above 500 Β°C we