✦ LIBER ✦

Chemical vapor deposition of scandium hydride

✍ Scribed by Takaaki Kobayashi; Humihiko Takei

Publisher: Elsevier Science
Year: 1978
Tongue: English
Weight: 954 KB
Volume: 45
Category: Article
ISSN: 0022-0248
DOI: 10.1016/0022-0248(78)90412-8

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Chemical vapor deposition of tungsten ox

Chemical vapor deposition of tungsten oxide

✍ Rein U. Kirss; Lamartine Meda 📂 Article 📅 1998 🏛 John Wiley and Sons 🌐 English ⚖ 117 KB 👁 1 views

Crystalline and amorphous thin films of tungsten(VI) oxide can be prepared by chemical vapor deposition using a variety of volatile precursors below 500 °C. Deposition parameters for preparation of WO 3 films from tungsten hexacarbonyl [W(CO) 6 ], tungsten hexafluoride (WF 6 ), tungsten ethoxides [W

Chemical vapor deposition of titanium di

Chemical vapor deposition of titanium diboride

✍ Takehiko Takahashi; Hideo Kamiya 📂 Article 📅 1974 🏛 Elsevier Science 🌐 English ⚖ 739 KB

Section IV. Chemical vapor deposition

📂 Article 📅 1981 🏛 Elsevier Science 🌐 English ⚖ 16 KB

Halide Chemical Vapor Deposition of Bi4T

Halide Chemical Vapor Deposition of Bi4Ti3O12

✍ Mikael Schuisky; Anders Hårsta 📂 Article 📅 1998 🏛 John Wiley and Sons 🌐 English ⚖ 430 KB 👁 1 views

Chemical vapor deposition precursor chem

Chemical vapor deposition precursor chemistry. 5. The photolytic laser deposition of aluminum thin films by chemical vapor deposition

✍ John A. Glass Jr; Seong-Don Hwang; Saswatti Datta; Brian Robertson; James T. Spe 📂 Article 📅 1996 🏛 Elsevier Science 🌐 English ⚖ 814 KB

Mechanisms of chemical vapor deposition

Mechanisms of chemical vapor deposition of silicon

✍ J. Nishizawa; H. Nihira 📂 Article 📅 1978 🏛 Elsevier Science 🌐 English ⚖ 556 KB