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Chemical Vapor Deposition of MoS2 Films

โœ Scribed by Mun, J.; Kim, D.; Yun, J.; Shin, Y.; Kang, S.; Kim, T.

Book ID
125446686
Publisher
The Electrochemical Society
Year
2013
Tongue
English
Weight
236 KB
Volume
58
Category
Article
ISSN
1938-6737

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ChemInform Abstract: Chemical Vapor Deposition of MoS2 and TiS2 Films from the Metal- Organic Precursors Mo(S-tBu)4 and Ti(S-tBu)4.
โœ J. CHEON; J. E. GOZUM; G. S. GIROLAMI ๐Ÿ“‚ Article ๐Ÿ“… 2010 ๐Ÿ› John Wiley and Sons โš– 29 KB ๐Ÿ‘ 2 views

Chemical Vapor Deposition of MoS2 and TiS2 Films from the Metal-Organic Precursors Mo(S-tBu)4 and Ti(S-tBu)4. -The formation of thin MoS2 and TiS2 films by MOCVD from the title precursors is studied and the decomposition mechanism is described. Amorphous films with low levels of oxygen and carbon co