✦ LIBER ✦
ChemInform Abstract: Preparation of Device-Quality SiO2 Thin Films by Remote Plasma- Enhanced Chemical Vapor Deposition (PECVD): Applications in Metal- Oxide-Semiconductor (MOS) Devices
✍ Scribed by G. LUCOVSKY
- Book ID
- 112037162
- Publisher
- John Wiley and Sons
- Year
- 2010
- Weight
- 29 KB
- Volume
- 27
- Category
- Article
- ISSN
- 0931-7597
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