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Chemical Vapor Deposition of MgAl 2 O 4 Thin Films Using Different Mg−Al Alkoxides: Role of Precursor Chemistry

✍ Scribed by Mathur, Sanjay; Veith, Michael; Ruegamer, Thomas; Hemmer, Eva; Shen, Hao

Book ID
118255846
Publisher
American Chemical Society
Year
2004
Tongue
English
Weight
519 KB
Volume
16
Category
Article
ISSN
0897-4756

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Atmospheric pressure chemical vapour deposition of WO3 thin films from a volatile fluorinated tungsten oxo-alkoxide precursor, W(O)(OCH2CF3)4
✍ K. C. Molloy; P. A. Williams 📂 Article 📅 2008 🏛 John Wiley and Sons 🌐 English ⚖ 163 KB 👁 2 views

## Abstract The monomeric tungsten oxo‐fluoroalkoxide W(O)(CH~2~CF~3~)~4~ (1) was synthesized from W(O)Cl~4~ and CF~3~CH~2~OH in the presence of ammonia. It was used in atmospheric pressure chemical vapour deposition experiments to deposit non‐stoichiometric WO~2.9~ when used as a single‐source pre