๐”– Bobbio Scriptorium
โœฆ   LIBER   โœฆ

Chemical-mechanical polishing of oxide thin films: The rebinder-westwood phenomenon revisited

โœ Scribed by Krishna Rajan

Book ID
112815085
Publisher
Springer US
Year
1996
Tongue
English
Weight
317 KB
Volume
25
Category
Article
ISSN
0361-5235

No coin nor oath required. For personal study only.

๐Ÿ“œ SIMILAR VOLUMES

[IEEE Eleventh Biennial University/Gover
[IEEE Eleventh Biennial University/Government/ Industry Microelectronics Symposium - Austin, TX, USA (16-17 May 1995)] Proceedings of the Eleventh Biennial University/Government/ Industry Microelectronics Symposium - An investigation of the chemical mechanical polishing of copper thin films to form in-laid interconnections in the dielectric (SiO/sub 2/) films
โœ Steigerwald, J.M.; Murarka, S.P.; Gutmann, R.J.; Duquette, D.J. ๐Ÿ“‚ Article ๐Ÿ“… 1995 ๐Ÿ› IEEE โš– 130 KB