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Chemical Mechanical Polishing of Low-Dielectric-Constant Polymers: Hydrogen Silsesquioxane and Methyl Silsesquioxane

✍ Scribed by Chen, Wen-Chang

Book ID: 126941587
Publisher: The Electrochemical Society
Year: 1999
Tongue: English
Weight: 225 KB
Volume: 146
Category: Article
ISSN: 0013-4651
DOI: 10.1149/1.1392043

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