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Characterization of tantalum oxynitride thin films as high-temperature strain gauges

✍ Scribed by I. Ayerdi; E. Castaño; A. García-Alonso; F.J. Gracia


Publisher
Elsevier Science
Year
1995
Tongue
English
Weight
269 KB
Volume
46
Category
Article
ISSN
0924-4247

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## Abstract Copper oxide thin films were obtained by annealing (temperature ranging between 100 and 450 °C) the metallic Cu films deposited on glass substrates by e‐beam evaporation. XRD studies confirmed that the cubic Cu phase of the as‐deposited films changes into single cubic Cu~2~O phase and s