Preparation and characterization of Ni–Mn–Ga high temperature shape memory alloy thin films using rf magnetron sputtering method

Growth of Ni–Mn–Ga high-temperature shap

Growth of Ni–Mn–Ga high-temperature shape memory alloy thin films by magnetron sputtering technique

✍ C. Liu; H.W. Mu; L.X. Gao; W.J. Ma; X. An; Z.Y. Gao; W. Cai 📂 Article 📅 2010 🏛 Elsevier Science 🌐 English ⚖ 820 KB

Ni-Mn-Ga thin films have been fabricated by using magnetron sputtering technique under various substrate negative bias voltages. The effect of substrate negative bias voltage on the compositions and surface morphology of Ni-Mn-Ga thin films was systematically investigated by energy dispersive X-ray