Coupled heat transfer and thermal stress
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B. Gu; P.E. Phelan; S. Mei
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Article
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1998
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Elsevier Science
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English
β 322 KB
A coupled heat transfer and thermal stress analysis is developed for a thin-film high-T c superconductor device. The thermal boundary resistance between the film and substrate, which is modelled as a function of interfacial peeling stress, is used to couple the structural and thermal sides of the mo