𝔖 Bobbio Scriptorium
✦   LIBER   ✦

Characterization of structures fabricated by atomic force microscope lithography

✍ Scribed by Elain S. Fu; Xue-sen Wang; Ellen D. Williams

Book ID
117219724
Publisher
Elsevier Science
Year
1999
Tongue
English
Weight
385 KB
Volume
438
Category
Article
ISSN
0039-6028

No coin nor oath required. For personal study only.

πŸ“œ SIMILAR VOLUMES

Nano-lithography by electron exposure us
Nano-lithography by electron exposure using an Atomic Force Microscope
✍ P Davidsson; A Lindell; T MΓ€kelΓ€; M Paalanen; J Pekola πŸ“‚ Article πŸ“… 1999 πŸ› Elsevier Science 🌐 English βš– 423 KB

We have used a conductive Atomic Force Microscope (AFM) tip to expose a very thin resist film. An exposing current of low energy electrons was induced from the tip to the substrate by applying a small bias voltage. Uniform resist films as thin as 10 nm were fabricated using the Langmuir-Blodgett tec