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Characterization of stationary and pulsed inductively coupled RF discharges for plasma sterilization

✍ Scribed by Gans, T; Osiac, M; O'Connell, D; Kadetov, V A; Czarnetzki, U; Schwarz-Selinger, T; Halfmann, H; Awakowicz, P


Book ID
121444612
Publisher
Institute of Physics
Year
2005
Tongue
English
Weight
486 KB
Volume
47
Category
Article
ISSN
0741-3335

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The electric field due to a strong capacitive coupling between the induction coil and the walls of the plasma chamber is quite large despite the discharge being in the H-mode in N 2 and H 2 gases. And as such, this field will interfere with the measurement of the magnetic field thus causing a high d